Method and apparatus for drying substrates

Details Method and apparatus for drying substrates Method and apparatus for drying substrates

1997-08-07

1999-03-23

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

134186, 134902, 34 77, B08B 304, B08B 500

Patent

active

058846409

ABSTRACT:
A drying apparatus 20 for removing residual liquid from a substrate surface comprises a vapor chamber 25 having a vapor distributor 30 for introducing vapor into the chamber. The drying apparatus 20 further comprises a fluid system 35 comprising (i) a reservoir 40, (ii) a fluid dispenser 45 for introducing fluid into the reservoir, and (iii) a fluid level adjuster 50 for lowering a fluid surface level in the reservoir 40. A multi-point holder 62 is used for holding the substrate 55 at different holding points 63 on the substrate, while the fluid surface level is lowered relative to the substrate, so that residual liquid flows off the substrate surface without intersection of the lowering fluid surface level with holding points 63 on the substrate. The drying apparatus 20 dries substrates 55 substantially without forming stains or streaks, or causing contamination or liquid residue to remain on the substrate 55.

REFERENCES:
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patent: 5569330 (1996-10-01), Schild et al.
patent: 5575079 (1996-11-01), Yokomizo et al.
patent: 5660642 (1997-08-01), Britten
patent: 5714203 (1998-02-01), Schellenberger
patent: 5752532 (1998-05-01), Schwenkler
patent: 5807439 (1998-09-01), Akatsu et al.

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