Method and apparatus for drying substrate

Drying and gas or vapor contact with solids – Process – Gas or vapor contact with treated material

Reexamination Certificate

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Details

C034S468000, C034S469000, C034S072000, C034S073000, C034S074000, C134S095200

Reexamination Certificate

active

06904702

ABSTRACT:
The substrate drying apparatus has a substrate processing vessel1, a substrate supporting section for supporting plural substrates2in a standing condition and lined up condition in the interior of the substrate processing vessel1, fluid reservoir section3for drying provided at an upward predetermined position of the substrate processing vessel1, a first inert gas supplying section4for blowing inert gas against the drying fluid6pooled in the fluid reservoir section3for drying so as to generate droplet of the drying fluid, and for guiding the droplet towards the center of the substrate processing vessel1, and a second inert gas supplying section5for supplying inert gas vertically and downwardly so as to supply the generated droplet of the drying fluid towards the substrates2, consequently safety is improved without providing special safety device, and sufficient amount of drying fluid is supplied to the dipping boundary face of the substrate and the cleaning liquid.

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