Method and apparatus for discharging an electrostatic chuck

Details Method and apparatus for discharging an electrostatic chuck Method and apparatus for discharging an electrostatic chuck

1999-02-17

2000-08-15

Jackson, Stephen W.

Electricity: electrical systems and devices

Discharging or preventing accumulation of electric charge

361234, H01G 100

Patent

active

061045950

ABSTRACT:
A method and apparatus for discharging a residual charge from an electrostatic chuck having one or more electrodes. The discharge process involves exposing a surface of the electrostatic chuck to energetic particles such as photons. The discharge apparatus includes a source of energetic particles as part of a semiconductor wafer processing system controlled by a computer. The source of energetic particles may be lamps such as "bakeout" lamps that are generally located within the process chamber. Photons in the form of infrared radiation from the lamps excite certain dopant atoms within the chuck material causing the material to exhibit the photoconductive effect. Such a photoconductive state will allow any residual charge on the surface of the chuck to be conducted away through the chuck electrodes.

REFERENCES:
patent: 4667110 (1987-05-01), Kariya
patent: 5117121 (1992-05-01), Watanabe et al.
patent: 5382311 (1995-01-01), Ishikawa et al.
patent: 5459632 (1995-10-01), Birang et al.
patent: 5764471 (1998-06-01), Burkhart

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