Method and apparatus for developing photosensitive lithographic

Details Method and apparatus for developing photosensitive lithographic Method and apparatus for developing photosensitive lithographic

1989-08-14

1993-05-11

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430320, 430434, 354317, 354319, 354325, G03F 726, G03D 308

Patent

active

052100057

ABSTRACT:
A method and an apparatus for developing a photosensitive lithographic plate at least one layer of which has been exposed with an image by a developer with conveying the same with the one layer facing substantially downwards, the method and apparatus being arranged in such a manner that the developer is supplied to the one layer and the thus-supplied developer is retained on the same layer.
Therefore, the photosensitive lithographic plate can be developed without any necessity of being dipped in the developer.

REFERENCES:
patent: 3282695 (1964-01-01), Narodny
patent: 3330197 (1965-01-01), Boeger
patent: 4001854 (1977-01-01), Formoy
patent: 4737810 (1988-04-01), Kobayashi et al.

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