Optics: measuring and testing – By light interference – Having wavefront division
Reexamination Certificate
2007-10-23
2007-10-23
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
By light interference
Having wavefront division
C356S491000, C356S494000, C356S520000
Reexamination Certificate
active
10628431
ABSTRACT:
A method and an apparatus for determining the influencing of the state of polarization of optical radiation by an optical system under test, wherein radiation with a defined entrance state of polarization is directed onto the optical system, the exit-side state of polarization is measured, and the influencing of the state of polarization is determined by the optical system with the aid of evaluation of the exit state of polarization with reference to the entrance state of polarization. An analyser arrangement which can be used for this purpose is also disclosed. The method and the apparatus are used, e.g., to determine the influencing of the state of polarization of optical radiation by an optical imaging system of prescribable aperture, the determination being performed in a pupil-resolved fashion.
REFERENCES:
patent: 4732483 (1988-03-01), Biegen
patent: 4762417 (1988-08-01), Wu et al.
patent: 4798468 (1989-01-01), Ohuchi
patent: 5166752 (1992-11-01), Spanier et al.
patent: 5227623 (1993-07-01), Heffner
patent: 5298972 (1994-03-01), Heffner
patent: 5396329 (1995-03-01), Kalawsky
patent: 5815268 (1998-09-01), LaFleur
patent: 5965874 (1999-10-01), Aso et al.
patent: 6061133 (2000-05-01), Freischlad
patent: 6204924 (2001-03-01), Cyr
patent: 6312373 (2001-11-01), Ichihara
patent: 6344898 (2002-02-01), Gemma et al.
patent: 2002/0024673 (2002-02-01), Ouchi
patent: 2002/0044287 (2002-04-01), Otaki
patent: 101 09 929 (2001-11-01), None
patent: 0 396 409 (1990-11-01), None
patent: 0 439 127 (1991-07-01), None
patent: 11-142291 (1999-05-01), None
patent: WO 02/42728 (2002-05-01), None
patent: WO 03/028073 (2003-04-01), None
“Optical Shop Testing”, Edited by:Daniel Malacara, John Wiley & Sons, Inc., Second Edition, pp. 112-113, 1992, USA.
Michael I. Shribak et al, “Return-Path Polarimeter for Two Dimensional Birefringence Distribution Measurement”, Jul. 1999, SPIE, pp. 144-145 and 148-149, vol. 3654, Denver Colorado.
S. Berezhna, et al., “Accuracy of Whole-Field Mapping by Jones Matrix Fourier Photopolarimeter”, 2000, Proceedings of SPIE, pp. 81-89, vol. 4148.
Dahl Manfred
Haidner Helmut
Hartl Michael
Mengel Markus
Schriever Martin
Carl Zeiss SMT AG
Lyons Michael A
Sughrue & Mion, PLLC
Toatley , Jr. Gregory J.
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