Optics: measuring and testing – Dimension
Reexamination Certificate
2007-08-28
2007-08-28
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
Dimension
C250S559190, C438S007000, C438S016000
Reexamination Certificate
active
09897573
ABSTRACT:
A test structure includes a first plurality of lines and a second plurality of lines intersecting the first plurality of lines. The first and second pluralities of lines defining a grid having openings. A method for determining grid dimensions includes providing a wafer having a test structure comprising a plurality of intersecting lines that define a grid having openings; illuminating at least a portion of the grid with a light source; measuring light reflected from the illuminated portion of the grid to generate a reflection profile; and determining a dimension of the grid based on the reflection profile. A metrology tool is adapted to receive a wafer having a test structure comprising a plurality of intersecting lines that define a grid having openings. The metrology tool includes a light source, a detector, and a data processing unit. The light source is adapted to illuminate at least a portion of the grid. The detector is adapted to measure light reflected from the illuminated portion of the grid to generate a reflection profile. The data processing unit is adapted to determine a dimension of the grid based on the reflection profile.
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Lensing Kevin R.
Markle Richard J.
Stirton J. Broc
Wright Marilyn I.
Advanced Micro Devices , Inc.
Stock, Jr. Gordon J.
Toatley , Jr. Gregory J.
Williams Morgan & Amerson P.C.
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