Method and apparatus for determining an accurate...

Details Method and apparatus for determining an accurate... Method and apparatus for determining an accurate...

2006-05-31

2008-11-18

Chiang, Jack (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C430S005000, C430S030000

Reexamination Certificate

active

07454739

ABSTRACT:
One embodiment of the present invention provides a system that determines an accurate process model. During operation, the system receives process data. Next, the system receives an optical model which models an optical system of a photolithography process. The system then determines a stack model using the optical model, wherein the stack model models the effects of the photolithography process on the stack layers. Finally, the system determines a process model using the optical model, the stack model, and the process data.

REFERENCES:
patent: 6871337 (2005-03-01), Socha
patent: 6880135 (2005-04-01), Chang et al.
patent: 2002/0161527 (2002-10-01), Inui
patent: 1 688 795 (2006-08-01), None
patent: 1 696 269 (2006-08-01), None
patent: 2 320 768 (1998-07-01), None
Chang-Nam Ahn, “A Novel Approximate Model for Resist Process,” SPIE vol. 3334, pp. 752-763, 1998.

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