Method and apparatus for determining a proximity correction...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C716S030000

Reexamination Certificate

active

07340713

ABSTRACT:
One embodiment of the present invention provides a system that determines a proximity correction for an integrated circuit layout. During operation, the system receives a layout. Next, the system receives an evaluation point within the layout. The system then determines a visible area associated with the evaluation point. Next, the system determines a proximity correction using the visible area.

REFERENCES:
patent: 5392222 (1995-02-01), Noble
patent: 6127071 (2000-10-01), Lu
patent: 6329107 (2001-12-01), Lu
patent: 6425117 (2002-07-01), Pasch et al.
patent: 6625801 (2003-09-01), Pierrat et al.
patent: 6629292 (2003-09-01), Corson et al.
patent: 6670081 (2003-12-01), Laidig et al.
patent: 6684382 (2004-01-01), Liu
patent: 6687885 (2004-02-01), Ono
patent: 6871338 (2005-03-01), Yamauchi
patent: 6892367 (2005-05-01), Palusinski et al.
patent: 7003757 (2006-02-01), Pierrat et al.
patent: 7065729 (2006-06-01), Chapman
patent: 7131104 (2006-10-01), Gallatin et al.
patent: 2002/0028393 (2002-03-01), Laidig et al.
patent: 2004/0003357 (2004-01-01), Palusinski et al.
patent: 2005/0257187 (2005-11-01), Gallatin et al.
patent: 2006/0002603 (2006-01-01), Beauchaine et al.
patent: 2006/0080634 (2006-04-01), Beale
patent: 2006/0143590 (2006-06-01), Beale
patent: 2006/0236296 (2006-10-01), Melvin et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for determining a proximity correction... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for determining a proximity correction..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for determining a proximity correction... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3968239

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.