Method and apparatus for determining a process model using a...

Details Method and apparatus for determining a process model using a... Method and apparatus for determining a process model using a...

2007-05-04

2010-06-15

Do, Thuan (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000

Reexamination Certificate

active

07739645

ABSTRACT:
One embodiment provides a system for determining an improved process model that models one or more semiconductor manufacturing processes. During operation, the system can receive a first process model. Next, the system can receive a 2-D-pattern detecting kernel which can detect 2-D patterns. The system can then receive a second set of empirical data which is associated with 2-D patterns in a test layout. Next, the system can determine an improved process model using the first process model, the 2-D-pattern detecting kernel, the test layout, and the second set of empirical data.

REFERENCES:
patent: 7234128 (2007-06-01), Gau et al.

Affiliated with

Also associated with

Rating

Method and apparatus for determining a process model using a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for determining a process model using a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for determining a process model using a... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4212903