Method and apparatus for detecting topographical features of...

Measuring and testing – Surface and cutting edge testing – Roughness

Reexamination Certificate

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C073S104000, C356S600000, C382S108000, C382S147000, C382S149000, C382S150000, C382S154000

Reexamination Certificate

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11157338

ABSTRACT:
An apparatus and method for detecting characteristics of a microelectronic substrate. The microelectronic substrate can have a first surface with first topographical features, such as roughness elements, and a second surface facing opposite from the first surface and having second topographical features, such as protruding conductive structures. In one embodiment, the apparatus can include a support member configured to carry the microelectronic substrate with a first portion of the first surface exposed and a second portion of the second surface exposed. The apparatus can further include a topographical feature detector positioned proximate to support member and aligned with the first portion of the first surface of the microelectronic substrate to detect characteristics, such as a roughness, of the first surface while the microelectronic substrate is carried by the support member.

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