Method and apparatus for detecting the presence and...

Details Method and apparatus for detecting the presence and... Method and apparatus for detecting the presence and...

2005-01-25

2005-01-25

Smith, Zandra V. (Department: 2877)

Optics: measuring and testing

Dimension

Thickness

C356S445000

Reexamination Certificate

active

06847463

ABSTRACT:
The characteristics of radiation that is reflected from carbon deposits and oxidation formations on highly reflective surfaces such as Mo/Si mirrors can be quantified and employed to detect and measure the presence of such impurities on optics. Specifically, it has been shown that carbon deposits on a Mo/Si multilayer mirror decreases the intensity of reflected HeNe laser (632.8 nm) light. In contrast, oxide layers formed on the mirror should cause an increase in HeNe power reflection. Both static measurements and real-time monitoring of carbon and oxide surface impurities on optical elements in lithography tools should be achievable.

REFERENCES:
patent: 6533952 (2003-03-01), Klebanoff et al.
patent: 6597463 (2003-07-01), Singh et al.
patent: 6727995 (2004-04-01), Halliyal et al.
patent: 20020085214 (2002-07-01), Dautartas et al.
patent: 20020145740 (2002-10-01), Meeks

Affiliated with

Also associated with

Rating

Method and apparatus for detecting the presence and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for detecting the presence and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for detecting the presence and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3434003