Method and apparatus for detecting particles on a substrate

Details Method and apparatus for detecting particles on a substrate Method and apparatus for detecting particles on a substrate

1995-06-30

1997-03-04

Raevis, Robert

Measuring and testing

Gas analysis

Solid content of gas

G01N 2188

Patent

active

056081553

ABSTRACT:
The apparent size of sub-micron contaminant particles on a wafer surface is enlarged by selective condensation of a vapor on the particles. The substrate is located proximate to and spaced apart from a liquid vapor source which is heated. The vaporized liquid adheres to the particles, and after a predetermined period of time, condensation of vapor on the substrate is stopped, and the substrate is scanned for detecting the particles.

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Bowling, R. Allen, et al., "Status and Needs of In-Situ Real-time Process Particle Detection," The Journal of Environmental Sciences, Jan./Feb. 1989, pp. 22-27.

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