Method and apparatus for detecting endpoint

Details Method and apparatus for detecting endpoint Method and apparatus for detecting endpoint

2007-11-20

2007-11-20

Chen, Kin-Chan (Department: 1765)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

C438S706000, C438S714000, C216S060000

Reexamination Certificate

active

10531468

ABSTRACT:
The present invention presents a method for detecting an endpoint of an etch process for etching a substrate in plasma processing system (1) comprising: etching the substrate; measuring at least one endpoint signal; generating at least one filtered endpoint signal by filtering the at least one endpoint signal, wherein the filtering comprises applying a Savitsky Golay filter (12) to the at least one endpoint signal; and determining (14) an endpoint of the etch process from the at least one filtered endpoint signal.

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