Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1999-02-17
2000-10-24
Diamond, Alan
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041921, 20419212, 20429813, 20429816, 20429819, 20429817, 136256, 136252, 136265, 257431, 257433, 257434, 427571, 428702, 438 57, 438 69, 438 85, C23C 1435, H01L 3104, H01L 3118
Patent
active
061361623
ABSTRACT:
A deposition method is adapted to deposit a zinc oxide film that has a high light transmittance, an adequate specific electric resistance and a large thickness at a high deposition rate and at low cost in a process that may last long but is stable. The method for depositing a zinc oxide film on a substrate held in an inert gas atmosphere is conducted by magnetron sputtering so that the maximum magnetic flux density in a direction parallel to the surface of the zinc oxide target is held to be not higher than 350 gauss.
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Omata Ako
Shiozaki Atsushi
Yoshida Yumi
Canon Kabushiki Kaisha
Diamond Alan
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