Method and apparatus for depositing charge and/or nanoparticles

Details Method and apparatus for depositing charge and/or nanoparticles Method and apparatus for depositing charge and/or nanoparticles

2007-06-19

2007-06-19

Everhart, Caridad (Department: 2891)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C977S901000, C438S468000, C257SE21028

Reexamination Certificate

active

10982179

ABSTRACT:
A method and apparatus for use in depositing electrical charge and/or nanoparticles is provided. A stamping process is used in which a stamp having a flexible layer such as a flexible semiconductor layer applies a charge pattern on a substrate. Other techniques include lithographic patterning, the use of pre-patterned dissimilar materials, deposition by ions or radiation, the use of differing work functions, the use of liquid phase materials. Deposition monitoring techniques and apparatuses are also provided.

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