Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1985-05-10
1987-01-06
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
118620, 118728, 156626, 156657, 156345, 219121LM, 427 531, 427 93, B44C 122, C03C 1500, C03C 2506, H01L 21306
Patent
active
046344977
ABSTRACT:
In the present invention, a semiconductor thin film, i.e., a thin film formed on a semiconductor substrate such as a gate oxide film, is formed and decomposed within a single treating vessel. An apparatus of the present invention for decomposing a semiconductor thin film comprises a treating vessel housing a semiconductor substrate, section for introducing into the treating vessel mediums for forming a desired semiconductor thin film on the semiconductor substrate housed in the treating vessel, section for introducing into the treating vessel a medium for decomposing into liquid the thin film formed on the substrate, and section for recovering the decomposed liquid of the semiconductor thin film.
REFERENCES:
patent: 4426246 (1984-01-01), Kravitz et al.
patent: 4438157 (1984-03-01), Romano-Moran
Schafer et al., "Optically Enhanced Oxidation of Semiconductors," J. Vac. Sci. Technol., vol. 19, No. 3, pp. 494-497, Sep. Oct. 1981.
Ellis et al., "Phenomenological Model for Silicon Oxidation in Dry Oxygen in the Presence of HCL," J. Electrochem Soc., vol. 130, No. 9, pp. 1970-1974, Sep. 1983.
Weston et al., "HF Vapor Phase Etching (HF/VPE): Production Viability For Semiconductor Manufacturing and Reaction Model, " J. Vac. Sci. Technol., vol. 17, No. 1, pp. 466-469, Jan/Feb 1980.
Sankaran et al., "Selective in Situ Vapor Etch and Growth of GaAs," J. Electrochem. Soc. Solid-State Science and Technology, vol. 126, No. 7, pp. 1241-1247, Jul. 1979.
Bondur et al., "Plasma Etching for SiO2 Profile Control," Solid State Technology, pp. 122-128, Apr. 1980.
Shimazaki et al., "Analysis of Ultratrace Impurities in the Silicon Device Manufacturing Process," Proceedings of the 26th Symposium on Semiconductors and Integrated Circuit Technology, p. 92, 1984.
Kabushiki Kaisha Toshiba
Powell William A.
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