Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Including heating
Patent
1995-07-27
1998-06-16
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Including heating
430327, 134 21, G03F 700
Patent
active
057668248
ABSTRACT:
A substrate photolithography system includes a substrate handling robot that pivots about a fixed point and transfers substrates between photoresist coater, a developer, and a heating/cooling unit, all of which are clustered about the robot. The end effector of the robot is capable of both vertical and lateral movement so that individual modules of the heating/cooling unit may be stacked. For heating/cooling, the substrate is placed in the heating/cooling unit in close proximity to a hotplate/chillplate and a thermally conductive, non-reactive gas, such as helium, is introduced into the airspace between the substrate and the hotplate/chillplate. The thermally conductive, non-reactive gas, is preheated/precooled before introduction into the airspace between the substrate and the hotplate/chillplate when the gas passes through a bore in the hotplate/chillplate. Additionally, the substrate is automatically aligned in a milled recession in the hotplate surface for future handling.
REFERENCES:
patent: 762888 (1904-06-01), Decker
patent: 2165122 (1939-07-01), Ashberry
patent: 3788719 (1974-01-01), Whited
patent: 3854605 (1974-12-01), Proper et al.
patent: 4744715 (1988-05-01), Kawabata
patent: 4842683 (1989-06-01), Cheng et al.
patent: 4935320 (1990-06-01), Rohde et al.
patent: 4951601 (1990-08-01), Maydan et al.
patent: 4985722 (1991-01-01), Ushijima et al.
patent: 5048164 (1991-09-01), Harima
patent: 5061144 (1991-10-01), Akimoto et al.
patent: 5135608 (1992-08-01), Okutani
patent: 5171393 (1992-12-01), Moffat
patent: 5202716 (1993-04-01), Tateyama et al.
Korolkoff, Nicholas O., "Integrated Processing Part II--Cluster Tool Systems", Solid State Technology, vol. 33, No. 10, Oct. 1990, pp. 82-90.
Lovell, Anthony M., et al., "Cell Automation; Integrating Manufacturing With Robotics", Solid State Technology, vol. 33, No. 12, Dec. 1990, pp. 37-39.
Batchelder William T.
Biche Michael R.
Parodi Michael L.
Duda Kathleen
Semiconductor Systems, Inc.
Steuber David E.
LandOfFree
Method and apparatus for curing photoresist does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for curing photoresist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for curing photoresist will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1723703