Method and apparatus for creating efficient vias between...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C716S030000

Reexamination Certificate

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10335246

ABSTRACT:
A system for creating efficient vias between metal layers in semiconductor designs that employ diagonal wiring is disclosed. The system combines advantages of both octagonal shaped vias and square shaped vias. Specifically, octagonal shaped vias are ideal for integrated circuit layouts that contain diagonal wiring since the diagonal wiring may be placed closer to the center the via due to the bevel corners. However, octagonal vias are difficult to manufacture. Square vias have been traditionally used within integrated circuits and the techniques to manufacture square vias are well-known. Since the final manufactured output of an ideal square via is similar to the final output of an ideal octagonal via, one system that may be employed is to design an integrated circuit with octagonal vias and then replace those octagonal shaped vias with square vias just before manufacturing. The replacement square vias must be chose to produce an output shape that is very similar to the output of the ideal octagonal via.

REFERENCES:
patent: 6247853 (2001-06-01), Papadopoulou et al.
patent: 6475877 (2002-11-01), Saia et al.
patent: 6656644 (2003-12-01), Hasegawa et al.
patent: 6769099 (2004-07-01), Li et al.
patent: 2003/0005399 (2003-01-01), Igarashi et al.

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