Method and apparatus for coupling a microwave source in an elect

Details Method and apparatus for coupling a microwave source in an elect Method and apparatus for coupling a microwave source in an elect

1990-09-27

1992-05-05

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511121, 31323131, 20429838, H05H 146

Patent

active

051111110

ABSTRACT:
A microwave source is coupled to an electron cyclotron resonance (ECR) system by circularly polarizing the microwave energy from the source in an angular direction with cooperates with the ECR system's magnetic field to produce electron cyclotron resonance, and coupling the circularly polarized microwave energy to the plasma using a quarter wave vacuum window transformer having a dielectric constant which matches the impedance of the circularly polarized microwave energy to the impedance of the plasma. The impedance matching transformer is preferably a vacuum window of the ECR chamber having quarter wave thickness and the appropriate dielectric constant. For high density plasmas in a standard ECR system of 6 cm radius an alumina window 0.98 cm thick procides optimum coupling. The reflected power from the plasma is thereby minimized to provide a dense plasma for the ECR tool while reducing or eliminating the need for manual external tuners for the microwave source.

REFERENCES:
patent: 4409520 (1983-10-01), Koike et al.
patent: 4417178 (1983-11-01), Geller et al.
patent: 4450031 (1984-05-01), Ono et al.
patent: 4507588 (1985-03-01), Asmussen et al.
patent: 4727293 (1988-02-01), Asmussen et al.
patent: 4788473 (1988-11-01), Mori et al.
patent: 4831963 (1989-05-01), Saito et al.
patent: 4859908 (1989-08-01), Yoshida et al.
patent: 4866346 (1989-09-01), Graudreau et al.
patent: 4877509 (1989-10-01), Ogawa et al.
patent: 4970435 (1990-11-01), Tanaka et al.
patent: 4987284 (1991-01-01), Fujimura et al.
patent: 5003152 (1991-03-01), Matsuo et al.
The Efficient Inject of High Microwave Powers into the Overdense Magnetoactive Plasma in the Waveguide, Musil, J. et al., Czech. J. Phys. B23 (1973), pp. 736-741.
An Experimental X-Band Electron-Cyclotron-Resonance Plasma Accelerator, IEEE Transactions on Microwave Theory and Techniques, pp. 162-164, Mar. 1966.
Non-Linear Electromagnetic Wave Transformation In a Longitudinally Magnetized Plasma Waveguide, A. Vegas et al., Plasma Physics and Controlled Fusion, vol. 26, No. 12B, pp. 1579-1589, 1984.
Anamalous Absorption of Intense Electromagnetic Waves in Plasma at High Magnetic Fields, J. Musil et al., Plasma Physics, vol. 16, pp. 735-739, Pergamon Press 1974.
Penetration Of A Strong Electromagnetic Wave In An Inhomogeneous Plasma Generated By ECR Using a Magnetic Beach, J. Musil et al., Plasma Physics, vol. 13, pp. 471-476, Pergamon Press 1971.
Electron-Cyclotron Resonance Heating of Alkali Plasmas, A. Levin, et al. Journal of Applied Physics, vol. 38, No. 11, 4435-4440, Oct. 1967.
Acceleration Continue De Plasma A. Gradients De Champs Electromagnetique Et Magnetsave Statique, Resultats Experimentaux, R. Bardet et al., Physics Letters, vol. 10, No. 1, May 1964.
Plasma Etching With A Microwave Cavity Plasma Disk Source, J. Hopwood et al. J. Vac. Sci. Technol. B6 (1), Jan/Feb. 1988, pp. 268-271.
Reactive Ion Beam Etching Using A Broad Beam ECR Ion Source, S. Matsuo et al., Japanese Journal of Applied Physics, vol. 21, No. 1, Jan. 1982, pp. L4-L6.
Microwave Multipolar Plasmas Excited by Distributed Electron Cyclotron Resonance:Concept and Performance, M. Pichot et al., Rev. Sci. Instrum. 59(7), Jul. 1988, pp. 1072-1075.
Microwave Plasma Etching, K. Suzuki et al., Vaccum, vol. 34, No. 10/11, pp. 953-957, Pergamon Press 1984.
Microwave Plasma Etching, K. Suzuki et al., Japanese Journal of Applied Physics, vol. 16, No. 11, pp. 1979-1984, Nov. 1977.

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