Method and apparatus for correcting 3D mask effects

Details Method and apparatus for correcting 3D mask effects Method and apparatus for correcting 3D mask effects

2007-12-11

2007-12-11

Dinh, Paul (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C430S005000

Reexamination Certificate

active

11033415

ABSTRACT:
One embodiment of the present invention provides a system that improves lithography performance by correcting for 3D mask effects. During operation the system receives a mask layout that contains etched regions, called shifters, which can have a phase shift relative to other regions. Next, the system chooses a shifter in the mask layout. The system then corrects for 3D mask effects by, iteratively, (a) selecting a region within the shifter, (b) adjusting the phase shift of the selected region in a simulation model to account for 3D mask effects, and (c) modifying the shape of the shifter based on the difference between a desired pattern and a simulated pattern generated using the simulation model.

REFERENCES:
patent: 6127071 (2000-10-01), Lu
patent: 6303253 (2001-10-01), Lu
patent: 6670082 (2003-12-01), Liu et al.
patent: 6785879 (2004-08-01), Pierrat
patent: 6794096 (2004-09-01), Kroyan
patent: 6830854 (2004-12-01), Liu et al.
patent: 6993741 (2006-01-01), Liebmann et al.
patent: 7005218 (2006-02-01), Zhang
patent: 7194163 (2007-03-01), Stepanov
patent: 2005/0219502 (2005-10-01), Sandstrom et al.

Affiliated with

Also associated with

Rating

Method and apparatus for correcting 3D mask effects does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for correcting 3D mask effects, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for correcting 3D mask effects will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3829190