Method and apparatus for controlling the radial temperature grad

Electric resistance heating devices – Heating devices – Radiant heater

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Details

392418, 219390, 219411, A21B 200

Patent

active

06064799&

ABSTRACT:
A method and apparatus for controlling the radial temperature gradients of a wafer and a susceptor while ramping the temperature of the wafer and susceptor using a first heat source that is primarily directed at a central portion of the wafer, a second heat source that is primarily directed at an outer portion of the wafer, a third heat source that is primarily directed at a central portion of the susceptor, and a fourth heat source that is primarily directed at an outer portion of the susceptor. Ramping of the wafer and susceptor temperature is accomplished by applying power to the first, second, third and fourth heat sources. During ramping, the ratio of the first and second heat source powers is varied as a function of the wafer temperature and the ratio of the third and fourth heat source powers is varied as a function of the susceptor temperature.

REFERENCES:
patent: 3836751 (1974-09-01), Anderson
patent: 5085887 (1992-02-01), Adams et al.
patent: 5108792 (1992-04-01), Anderson et al.
patent: 5179677 (1993-01-01), Anderson et al.
patent: 5650082 (1997-07-01), Anderson

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