Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2008-01-08
2008-01-08
Alejandro-Mulero, Luz (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S7230MR, C118S7230MA, C118S7230IR, C118S7230ER, C156S345420, C156S345460, C156S345490, C315S111410
Reexamination Certificate
active
10146443
ABSTRACT:
A magnetic field generator for producing a magnetic field that accelerates plasma formation is placed proximate a reaction chamber of semiconductor substrate processing system. The magnetic field generator has four main magnetic coil sections for producing a magnetic field nearly parallel to the top surface of a support pedestal in the reaction chamber and four sub-magnetic coil sections placed generally coaxially with the main magnetic coil sections to produce a magnetic field of the direction opposite of that of the magnetic field produced with the main magnetic coil sections. In the magnetic field generator, magnetic fields of opposite polarities are superimposed on each other when electric currents of opposite directions are applied to the main and sub-magnetic coil sections.
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Burns Douglas H.
Horioka Keiji
Hughes Panyin
Lee Evans Y.
Li Qi
Alejandro-Mulero Luz
Applied Materials Inc.
Moser IP Law Group
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