Method and apparatus for controlling temperature in rapid heat t

Details Method and apparatus for controlling temperature in rapid heat t Method and apparatus for controlling temperature in rapid heat t

1994-06-13

1997-04-01

Paschall, Mark H.

Electric heating

Heating devices

With power supply and voltage or current regulation or...

219497, 219486, 219483, 392417, 373136, H05B 102

Patent

active

056162642

ABSTRACT:
A temperature control method in a rapid heat treatment apparatus comprising simulatively heating dummy wafers in a process tube and previously detecting and grasping by temperature sensors a wafer temperature rising pattern, a heater temperature rising pattern and an internal atmosphere temperature rising pattern, arranging wafers to be processed in the process tube, detecting a temperature of each zone and that of each heater element by the temperature sensors, upon heating the wafers, and controlling each heater element on the basis of the detected temperatures and the wafer, heater and internal atmosphere temperature rising patterns by a controller to rapidly and uniformly raise the temperature of each wafer until the temperature of the wafers in each zone reaches the intended one and becomes stable.

REFERENCES:
patent: 5233163 (1993-08-01), Mieno et al.
patent: 5323484 (1994-06-01), Nakao et al.
patent: 5446825 (1995-08-01), Moslehi et al.

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