Method and apparatus for controlling plasma processing

Details Method and apparatus for controlling plasma processing Method and apparatus for controlling plasma processing

1991-08-15

1993-11-30

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427575, 427562, 427561, 118723MA, B05D 306, C23C 1600

Patent

active

052663647

ABSTRACT:
A method and apparatus for controlling plasma generated utilizing microwaves and a magnetic field. Microwaves including right and left circularly polarized waves are generated and introduced into a processing chamber and a ratio of the right circularly polarized waves to the left circularly polarized waves is controlled to enable control of at least one of an electron temperature and a density distribution for plasma processing.

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