Method and apparatus for controlling a multi-chamber...

Details Method and apparatus for controlling a multi-chamber... Method and apparatus for controlling a multi-chamber...

2005-05-17

2005-05-17

Picard, Leo (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S109000, C438S014000

Reexamination Certificate

active

06895295

ABSTRACT:
A method for controlling a processing tool having a plurality of chambers includes processing a wafer in a first chamber of the processing tool; measuring a characteristic of the wafer; and modifying an operating recipe of one of the plurality of chambers based on the measured characteristic. A system for processing semiconductor wafers includes a processing tool, a metrology tool, and a process controller. The processing tool includes a plurality of chambers. The metrology tool is adapted to measure a characteristic of a wafer processed in a first chamber of the processing tool. The process controller is adapted to modify an operating recipe of one of the plurality of chambers based on the measured characteristic.

REFERENCES:
patent: 5940175 (1999-08-01), Sun
patent: 6625497 (2003-09-01), Fairbairn et al.
patent: 20030165755 (2003-09-01), Mui et al.

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