Method and apparatus for controlling a calibration cycle or...

Details Method and apparatus for controlling a calibration cycle or... Method and apparatus for controlling a calibration cycle or...

2007-08-28

2007-08-28

Punnoose, Roy M. (Department: 2886)

Optics: measuring and testing

Dimension

Thickness

C250S252100, C702S040000, C702S085000, C702S097000, C702S172000

Reexamination Certificate

active

10788498

ABSTRACT:
A method and apparatus for controlling when a calibration cycle is started for a metrology tool. The method and apparatus exploits a correlation between a drift of a first parameter (e.g., film thickness measurement drift) and a drift of a second parameter (e.g., CD measurement drift). One embodiment of the method comprises measuring a film thickness on one or more reference substrates to determine when a drift component of these measurements exceeds a pre-determined range and thereafter calibrating the metrology tool when the drift component of the film thickness measurements exceeds the pre-determined range. Generally, the drift of the film thickness measurement will occur prior to substantial drift of the CD measurement occurring.

REFERENCES:
patent: 6245581 (2001-06-01), Bonser et al.
patent: 6281818 (2001-08-01), Miller
patent: 6532428 (2003-03-01), Toprac
patent: 6654698 (2003-11-01), Nulman
patent: 6795193 (2004-09-01), Schulz
patent: 7075643 (2006-07-01), Holub
patent: 2003/0223072 (2003-12-01), Schulz

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