Method and apparatus for control of deposit build-up on an inner

Details Method and apparatus for control of deposit build-up on an inner Method and apparatus for control of deposit build-up on an inner

1997-03-31

2000-03-14

Gulakowski, Randy

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

216 68, 156345, 20419232, 438905, C25F 314

Patent

active

060358688

ABSTRACT:
A method and apparatus for controlling deposit build-up on an interior surface of a dielectric member of a plasma processing chamber. The deposit build-up is controlled by selective ion bombardment of the inner surface by shifting location of a peak voltage amplitude of a voltage standing wave on an antenna such as a flat spiral coil of the plasma processing chamber. A region of high ion bombardment on the interior surface of the dielectric member is displaced by controlling the value of a termination capacitance over a range of values causing regions of low and high ion bombardment to move over the dielectric member in order to effect cleaning thereof.

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