Method and apparatus for comparing device and non-device...

Semiconductor device manufacturing: process – Including control responsive to sensed condition

Reexamination Certificate

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C438S006000, C438S007000, C438S010000, C438S011000, C438S014000, C438S016000, C438S017000, C438S018000, C257SE21525, C356S004010, C356S005090

Reexamination Certificate

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10980517

ABSTRACT:
The present invention provides a method and apparatus for comparing device and non-device structures. The method includes determining at least one characteristic parameter associated with at least one non-device structure on at least one workpiece and determining at least one characteristic parameter associated with at least one device structure on the at least one workpiece. The method also includes comparing the at least one characteristic parameter associated with the at least one non-device structure and the at least one characteristic parameter associated with at least one device structure.

REFERENCES:
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patent: 6587744 (2003-07-01), Stoddard et al.
patent: 6697153 (2004-02-01), Wright et al.
patent: 6751343 (2004-06-01), Ferrell et al.
patent: 6972576 (2005-12-01), Lyons et al.
patent: 7171536 (2007-01-01), Chang et al.
patent: 2004/0080998 (2004-04-01), Chang et al.
Wolf et al., Silicon Processing for the VLSI Era, 1986, Lattice Press, vol. 1, p. 235.

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