Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1988-10-21
1990-06-19
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419235, 20429835, 20429837, 156345, 156643, 134 1, C23F 400, C23F 404
Patent
active
049351150
ABSTRACT:
The invention relates to a method and apparatus for continuously cleaning a long metal substrate, such as a wire, a band, a cord, etc., the long substrate to be cleaned being led through a vacuum chamber, whereinto an inert sputtering gas, such as argon, is fed, and a sufficiently high voltage being maintained between the substrate as cathode and an anode present in the chamber so that an electric discharge takes place between the two electrode, as a result of which the substrate is cleaned by inert gas ions bombarding it during its passage through the vacuum chamber, and the anode being formed by at least one annular electrode, fitted in a long casing of heat-radiation transmitting material and the long substrate being led through the casing in longitudinal direction. The invention further relates to the thus cleaned metal substrates, as well as to the objects of polymer material reinforced therewith.
REFERENCES:
patent: 2916409 (1959-12-01), Bucek
patent: 3326177 (1967-06-01), Taylor
patent: 3654108 (1972-04-01), Smith, Jr.
patent: 3728246 (1973-04-01), Barkhudarov et al.
patent: 3884793 (1975-05-01), Penfold et al.
Patent Abstracts of Japan, vol. 4, No. 173 (C-32)[655], Nov. 29, 1980; & JP-A-55 110 782 (Hitachi Seisakusho K.K.) 26-08-1980).
Chemicals Abstracts, vol. 90, No. 24, Jun. 1979, p. 242, Abstract No. 190706p, Columbus, Ohio & JP-A-79 01 242 (Agency of Industrial Sciences and Technology) 08-01-1979.
Chambaere Daniel
Colpaert Alex
Coppens Wilfried
De Gryse Roger
Hoogewijs Robert
N.V. Bekaert S.A.
Weisstuch Aaron
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