Cleaning and liquid contact with solids – Apparatus – With means to movably mount or movably support the work or...
Patent
1998-11-11
2000-09-19
Coe, Philip R.
Cleaning and liquid contact with solids
Apparatus
With means to movably mount or movably support the work or...
134147, 134184, 134902, B08B 312
Patent
active
061197084
ABSTRACT:
A method and apparatus for cleaning wafer edges is provided. The inventive wafer cleaner employs a transducer equal in length to the diameter of a wafer to be cleaned, and positioned to direct sonic energy in line with the wafer's edge. Supporting and rotating mechanisms are positioned along the wafer's edge, outside of the transducer's high energy field, and preferably such that approximately 50 percent of the wafer is positioned between the wafer supports and the transducer. Therefore, minimal sonic energy is blocked from reaching the wafer's surface. The transducer dimensions relative to the wafer, and the positioning of the wafer supports relative to the transducer enable the system to achieve an approximately 50 percent edge cleaning duty cycle as the wafer is rotated.
REFERENCES:
patent: 4869278 (1989-09-01), Bran
patent: 5090432 (1992-02-01), Bran
patent: 5379785 (1995-01-01), Ohmori et al.
patent: 5383484 (1995-01-01), Thomas et al.
patent: 5672212 (1997-09-01), Manos
STEAG Electronic Systems CMP--"STEAG announces the Trident 300 Post-CMP Cleaner".
Brown Brian J.
Fishkin Boris
Tang Jianshe
Applied Materials Inc.
Coe Philip R.
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