Method and apparatus for cleaning a CVD chamber

Details Method and apparatus for cleaning a CVD chamber Method and apparatus for cleaning a CVD chamber

2009-02-17

2010-02-02

Hassanzadeh, Parviz (Department: 1792)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345470

Reexamination Certificate

active

07654224

ABSTRACT:
The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.

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