Method and apparatus for clean photomask handling

Details Method and apparatus for clean photomask handling Method and apparatus for clean photomask handling

2004-06-09

2008-11-18

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07452637

ABSTRACT:
Some embodiments of the present invention include protecting a photomask from particle defects by heating the photomask to initiate a thermophoretic force.

REFERENCES:
patent: 6153044 (2000-11-01), Klebanoff et al.
patent: 6253464 (2001-07-01), Klebanoff et al.
patent: 6492067 (2002-12-01), Klebanoff et al.
Rader et al; “Verfication Studies of Thermophoretic Protection for EUV Masks”, Emerging Lithographic Technologies VI, Proceedings of SPIE vol. 4688, 2002 SPIE, pp. 182-193.

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