Image analysis – Pattern recognition – Feature extraction
Reexamination Certificate
2008-05-06
2008-05-06
Carter, Aaron W (Department: 2624)
Image analysis
Pattern recognition
Feature extraction
C356S237200, C250S559360, C348S128000
Reexamination Certificate
active
07369703
ABSTRACT:
A system for measuring a pattern on a sample, including: a data processing system that processes a set of two-dimensional distribution data of intensities from the sample, to calculate: a set of edge points indicative of position of edges of the pattern in a two-dimensional plane from the two-dimensional distribution data; an approximation edge indicative of the edge of the pattern; an edge fluctuation data by calculating a difference between the set of edge points and the approximation edge; and a correlation between a first portion of the edge fluctuation data and a second portion of the edge fluctuation data.
REFERENCES:
patent: 4750140 (1988-06-01), Asano et al.
patent: 4792232 (1988-12-01), Jobe et al.
patent: 5805728 (1998-09-01), Munesada et al.
patent: 6433348 (2002-08-01), Abboud et al.
patent: 6781688 (2004-08-01), Kren et al.
patent: 6839470 (2005-01-01), Ikeda
patent: 8-14836 (1996-01-01), None
patent: 2000-58410 (2000-02-01), None
patent: 2001-183116 (2001-07-01), None
patent: 2001-224017 (2001-08-01), None
1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, p. 259-261.
J. Vac. Sci. Technol. B16(6), Nov./Dec. 1998, p. 3739-3743.
IEEE Electron Device Letters, vol. 22, No. 6, Jun. 2001, p. 287-289.
Iizumi Takashi
Komuro Osamu
Otaka Tadashi
Terasawa Tsuneo
Yamaguchi Atsuko
Antonelli, Terry Stout & Kraus, LLP.
Carter Aaron W
Hitachi , Ltd.
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