Method and apparatus for changing the imaging scale in X-ray lit

Details Method and apparatus for changing the imaging scale in X-ray lit Method and apparatus for changing the imaging scale in X-ray lit

1987-11-10

1989-12-12

Fields, Carolyn E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378208, G21K 508

Patent

active

048872822

ABSTRACT:
Am improved method for changing the image scale for a lithographic arrangement comprising a synchroton radiation creating a collimated beam of x-radiation passing through a mask onto an object to be structured, characterized by deforming the surface to be structured into a curved surface. The deforming into a curved surface can be either into a cylindrical curved surface or into a spherical curved surface.

REFERENCES:
patent: 4475223 (1984-10-01), Taniguchi et al.
patent: 4514857 (1985-04-01), Kimura et al.
patent: 4724222 (1988-02-01), Feldman
H. Schaumburg "Neue Lithografieverfahren in der Halbleitertechnik", Elektronic, 1978, No. 11, pp. 59-66.
J. Lyman, "Lithography Steps Ahead to Meet VLSI Challenge", Elektronics, Jul. 1983, pp. 121-128.
H. Luthje, "X--ray Lithography For VLSI", Philips Techn. Rev., vol. 41, 1983/4, No. 5, pp. 150-163.

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