Method and apparatus for avoiding undesirable deposits in crysta

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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422249, B01J 1718

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active

041417798

ABSTRACT:
In Czochralski crystal growing operations, particularly those involving growth of silicon crystals, projecting formations of silicon monoxide sometimes form on the surface of the melt-containing crucible just above the initial level of the melt. These formations are avoided by perturbing chemical formation conditions at the region of probable formation. Such perturbations may be provided by a tube through which either a positive pressure of a gas, such as argon, is directed toward the region of probable formation or through which a negative pressure may be applied to perturb the formation conditions.

REFERENCES:
patent: 3353914 (1967-11-01), Pickar
patent: 4036595 (1977-07-01), Lorenzini
Chartier et al., Solid State Technology, Feb. 1975, pp. 31-33.

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