Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-10-03
2009-02-24
Siek, Vuthe (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
07496880
ABSTRACT:
One embodiment of the present invention provides a system that assesses the quality of a process model. During operation, the system receives a mask layout and additionally receives a process model that models the effects of one or more semiconductor manufacturing processes on the mask layout. Next, the system computes a gradient of the process model with respect to a process model parameter. The system then computes a quality indicator at an evaluation point in the mask layout using the gradient of the process model and the mask layout. Next, the system assesses the quality of the process model using the quality indicator. In one embodiment, the system assesses the quality of the process model by comparing the quality indicator with a threshold.
REFERENCES:
patent: 6792592 (2004-09-01), Keogan et al.
patent: 6795587 (2004-09-01), Slavin
patent: 7243332 (2007-07-01), Melvin et al.
patent: 7251807 (2007-07-01), Melvin et al.
patent: 7315999 (2008-01-01), Melvin et al.
patent: 2003/0220828 (2003-11-01), Hwang et al.
Melvin, III Lawrence S.
Yan Qiliang
Park Vaughan & Fleming LLP
Siek Vuthe
Synopsys Inc.
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