Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2011-03-01
2011-03-01
Chowdhury, Tarifur (Department: 2886)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
Reexamination Certificate
active
07898662
ABSTRACT:
An overlay target on a substrate includes two sets of gratings; the first set having a pitch P1and the second set having a pitch P2and each set including a grating with an orientation substantially perpendicular to the first grating of each set. When a layer of resist is to be aligned with the layer below it, the same overlay marks are provided on the upper layer and the relative positions of the overlay targets on the upper layer and the lower layer are compared by shining an overlay beam on to the overlay targets and measuring the diffraction spectrum of the reflected beam. Having two sets of overlay targets with different pitches in gratings enables the measurement of overlay errors that are greater than the pitch of either one of the overlay gratings.
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Den Boef Arie Jeffrey
Keij Stefan Carolus Jacobus Antonius
Mos Everhardus Cornelis
Van Der Schaar Maurits
ASML Netherlands B.V.
Chowdhury Tarifur
LaPage Michael
Sterne Kessler Goldstein & Fox P.L.L.C.
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