Method and apparatus for analyzing a photoresist film

Details Method and apparatus for analyzing a photoresist film Method and apparatus for analyzing a photoresist film

2007-11-12

2009-12-08

Porta, David P (Department: 2884)

Radiant energy

Invisible radiant energy responsive electric signalling

Infrared responsive

C250S341400

Reexamination Certificate

active

07629583

ABSTRACT:
In a method for analyzing photoresist, light having a wavelength which responds to a photoresist film is selected. The photoresist film is exposed to the selected light. Changes of components and properties of the photoresist film are analyzed while the photoresist film is being exposed to the selected light.

REFERENCES:
patent: 6030266 (2000-02-01), Ida et al.
patent: 6385294 (2002-05-01), Suzuki et al.
patent: 09-265189 (1997-10-01), None
patent: 09265189 (1997-10-01), None
patent: 10-2004-0095554 (2004-11-01), None
patent: 0547279 (2006-01-01), None

Affiliated with

Also associated with

Rating

Method and apparatus for analyzing a photoresist film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for analyzing a photoresist film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for analyzing a photoresist film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4081012