Method and apparatus for an improved upper electrode plate...

Details Method and apparatus for an improved upper electrode plate... Method and apparatus for an improved upper electrode plate...

2006-12-12

2006-12-12

Hassanzadeh, Parviz (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

C118S7230ER, C118S7230AN, C156S916000

Reexamination Certificate

active

07147749

ABSTRACT:
The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.

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