Method and apparatus for adjusting a resonance frequency of piez

Details Method and apparatus for adjusting a resonance frequency of piez Method and apparatus for adjusting a resonance frequency of piez

1995-02-24

1997-09-02

Kunemund, Robert

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419218, 20419232, 20419233, 20429832, 20429835, 20429836, 156345, 216 59, 216 61, 216 66, 216 67, 427100, 438 13, C23C 1432, H01L 213063, B05D 512

Patent

active

056627823

ABSTRACT:
An apparatus and method for manufacturing resonant elements such as piezoelectric elements, quartz resonators and other resonant elements while monitoring and regulating the resonance frequencies of the elements are disclosed. A radiation source such as an ion gun provides a plasma to selectively remove portions of an electrode on the resonant element to increase the resonance frequency. The distance between the radiation source and the electrode may be varied while monitoring the resonance frequency and the distance adjusted based on the measured resonance frequency. Different stages with increasing distances between different radiation sources and the resonant element to provide consecutively finer adjustment may be used to consecutively bombard the electrode with ions, with the resonant element being conveyed to the different stages. Oscillators and related devices using the resonant elements are also disclosed.

REFERENCES:
patent: 3914836 (1975-10-01), Hafner et al.
patent: 4389275 (1983-06-01), Ballato
patent: 4454639 (1984-06-01), Dworsky et al.
patent: 4927484 (1990-05-01), Mitomi
patent: 5407525 (1995-04-01), Michel et al.

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