Method and apparatus for aberration-insensitive electron...

Details Method and apparatus for aberration-insensitive electron... Method and apparatus for aberration-insensitive electron...

2006-02-22

2008-07-29

Souw, Bernard E (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

C250S306000, C250S307000, C250S311000, C250S3960ML, C250S492300

Reexamination Certificate

active

07405402

ABSTRACT:
One embodiment relates to an electron beam apparatus for automated imaging of a substrate surface. An electron source is configured to emit electrons, and a gun lens is configured to focus the electrons emitted by the electron source so as to form an electron beam. A condenser lens system is configured to receive the electron beam and to reduce its numerical aperture to an ultra-low numerical aperture. An objective lens is configured to focus the ultra-low numerical aperture beam onto the substrate surface. Other embodiments are also disclosed.

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