Metallization of a ceramic substrate

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

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204192C, 204192N, 427 96, 427259, 427 38, 430318, 430319, H05K 310

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045268592

ABSTRACT:
There is disclosed a method of selectively metallizing a ceramic substrate provided with a metallization pattern according by photoresist processing. A first layer of photoresist is blanket deposited over the substrate exposed through a coarse block out mask, and developed in order to protect those areas of the metallization pattern not to be covered with metal. A blanket metal layer is then formed over the entire substrate surface. A second layer of photoresist is deposited, exposed through a customized mask of the metallization pattern, and developed. The exposed metal is etched and the remaining first and second photoresist layers are removed, leaving a coating of metal only at desired locations.
The method may be used for the heavy gold deposition over the Engineering change pads used as a standard in multilayer ceramic substrates.

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IBM Technical Disclosure Bulletin, vol. 15, No. 8, Jan. 1973, "Replaceable Engineering Change Pad", by J. G. Simek, pp. 2575-2576.
IBM Technical Disclosure Bulletin, vol. 20, No. 5, Oct. 1977, "Electroplating Process for Forming Heavy Gold Plating on Multilayer Ceramic Substrates", by D. Loehndorf, p. 1740.

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