Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2006-06-29
2008-11-11
Meeks, Timothy (Department: 1792)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C427S577000, C427S249700, C427S127000
Reexamination Certificate
active
07449221
ABSTRACT:
A method of manufacturing a metallic thin film type magnetic recording medium is provided. The method comprises the steps of arranging an initial substance of said recording medium in opposition to a plasma discharge electrode, said initial substance comprising a non-magnetic support base, a metallic layer capable of functioning as a metallic electrode formed on said non-magnetic support base and a metallic magnetic layer formed on said metallic layer, and forming a protection film on a surface of said initial substance of said recording medium by way of generating plasma discharge while feeding raw material gas between said metallic layer/said metallic magnetic layer and said plasma discharge electrode.
REFERENCES:
patent: 4601950 (1986-07-01), Iida et al.
patent: 6110584 (2000-08-01), Hiratsuka et al.
patent: 62146434 (1987-06-01), None
patent: 01166329 (1989-06-01), None
Hiratsuka Ryoichi
Kanagawa Ichiro
Ozaki Tomoe
Suzuki Kasumi
Meeks Timothy
Sonnenchein Nath & Rosenthal LLP
Sony Corporation
Turocy David
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