Metal vapor laser apparatus

Coherent light generators – Particular active media – Gas

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

372 69, 372 29, H01S 322

Patent

active

054523176

ABSTRACT:
A metal vapor laser apparatus is provided with a buffer gas and a laser medium are enclosed in a tube and the gas is utilized as an excitation or ionization medium in the tube. The metal vapor laser apparatus comprises molecules consisting of a plurality of elements and mixed by at least 0.1% in the gas enclosed in the tube and a gas having a molecular weight lighter than that of neon mixed by at least 0.1% in the gas enclosed in the tube.

REFERENCES:
patent: 3761838 (1973-09-01), Bhaumik et al.
patent: 3813612 (1974-05-01), Schriever et al.
patent: 4065731 (1977-12-01), Wang
patent: 4126890 (1978-11-01), Fournier et al.
patent: 4203078 (1980-05-01), Daugherty et al.
patent: 4417340 (1983-11-01), Horiuchi et al.
patent: 4646311 (1987-02-01), Nighan et al.
patent: 4821280 (1989-04-01), Vawase
patent: 4876690 (1989-10-01), Nishida et al.
patent: 4955033 (1990-09-01), Maitland et al.
patent: 5090020 (1992-02-01), Bedwell
patent: 5117434 (1992-05-01), Oohashi et al.
patent: 5150375 (1992-09-01), Tabata et al.
Patent Abstracts of Japan, vol. 14, No. 333 (E-955) (4287) JP-2-117189, Jul. 25, 1990.
Patent Abstracts of Japan, vol. 015, No. 110 (E-1046) JP-3-003383, Jan. 9, 1991.
Z. Huang et al., "Influence of Molecular Gases on the Output Characteristics of a Copper Vapor Laser", Japanese Journal of Applied Physics, vol. 25, No. 11, Nov. 1986, pp. 1677-1679.
P. A. Bokhan et al., "Mechanism of Laser Action in Copper Vapor", Sov. J. Quant. Electron, vol. 3, No. 6, May-Jun. 1974, pp. 481-483.
M. A. Lesnoi, "Influence of the Gas Mixture Composition and Cathode Material on the Output Power of a Copper Vapor Laser", Sov. J. Quantum Electron, 14(1), Jan. 1984, pp. 142-144.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Metal vapor laser apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Metal vapor laser apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metal vapor laser apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1834472

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.