Metal polishing composition and process

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

51307, 51317, 156645, 156664, 156903, 252 791, C23F 100, B44C 122, C03C 1500, C03C 2506

Patent

active

044759819

ABSTRACT:
Metal surfaces such as the working surfaces of nickel plated blanks for rigid memory discs are polished in a two-stage process of rough and finish polishing by a combination of mechanical and chemical mechanisms. Each stage involves a plurality of cycles in which the surface is polished using a rotating polishing pad with an aqueous suspension of aluminum oxide containing a lubricant-surfactant and a chlorine-containing oxidizing agent present at the surface-pad interface followed by the addition of an aqueous colloidal aluminum oxide sol to the oxidizing agent-containing suspension at the interface which frees the chlorine in the oxidizing agent to exert a chemical polishing action on the surface.

REFERENCES:
patent: 3342652 (1967-09-01), Reisman et al.
patent: 3429080 (1969-02-01), Lachapelle
patent: 4011099 (1977-03-01), Gutsche
patent: 4305779 (1981-12-01), Steeves et al.
patent: 4412886 (1983-11-01), Sakaguchi et al.

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