Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device
Reexamination Certificate
2010-01-06
2011-10-18
Richards, N Drew (Department: 2895)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Charge transfer device
C257S244000
Reexamination Certificate
active
08039876
ABSTRACT:
A metal oxide semiconductor (MOS) includes an isolation layer disposed in a semiconductor substrate to define an active region. A source region and a drain region are disposed on both sides of the active region such that a first direction is defined from the source region to the drain region. A channel recess is disposed in the active region between the source and drain regions. The channel recess has a convex surface when viewed from a cross-sectional view taken along a second direction orthogonal to the first direction. A gate electrode fills the channel recess and crosses the active region in the second direction. A gate insulating layer is interposed between the gate electrode and the active region.
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Korean Office Action issued in corresponding Korean Patent Application No. KR 10-2004-0088512 mailed Jan. 26, 2006.
Chung Tae-Young
Kim Yong-Sung
Lee Jae
Myers Bigel & Sibley & Sajovec
Richards N Drew
Samsung Electronics Co,. Ltd.
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