Metal oxide semiconductor (MOS) device, metal oxide...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S217000, C257S370000, C257S371000, C257S374000, C257S377000, C257SE29287, C257SE21562, C257SE21570

Reexamination Certificate

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11271922

ABSTRACT:
A semiconductor device includes a first semiconductor layer that is formed on a first insulating layer; a second insulating layer that is formed on the first semiconductor layer; a second semiconductor layer that is formed on the second insulating layer; a first gate electrode that is formed on the second semiconductor layer; first conductive-source and drain layers that are formed in the second semiconductor layer and are arranged at sides of the gate electrode; and a first wiring layer that connects the first gate electrode to the first semiconductor layer.

REFERENCES:
patent: 4377756 (1983-03-01), Yoshihara et al.
patent: 6670716 (2003-12-01), Christensen et al.
patent: 2001/0025991 (2001-10-01), Kim
patent: 2003/0205765 (2003-11-01), Masuoka
patent: 2003/0230784 (2003-12-01), Iwata et al.
patent: 2005/0009306 (2005-01-01), Mitani et al.
patent: 2005/0232008 (2005-10-01), Shukuri et al.
patent: 2006/0131660 (2006-06-01), Ohsawa
patent: 2006/0197111 (2006-09-01), Matsuzawa
patent: A 2000-022160 (2000-01-01), None
patent: A 2000-114399 (2000-04-01), None
patent: A 2002-353340 (2002-12-01), None

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