Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1995-06-02
1997-04-29
Huff, Mark F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430331, 430338, 524466, 524463, 524556, 528482, 528487, 528470, 521 26, G03C 172, G03F 700, C02F 142
Patent
active
056247893
ABSTRACT:
The present invention provides methods for producing top anti-reflective coating compositions having a very low level of metal ions, utilizing specially treated ion exchange resins. A method is also provided for producing semiconductor devices using such top anti-reflective coating compositions.
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Durham Dana L.
Rahman M. Dalil
Hoechst Celanese Corporation
Huff Mark F.
Sayko Jr. Andrew F.
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