Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1992-12-29
1995-12-19
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430168, 430169, 430192, 430193, 528482, 528486, 528145, 528146, 210660, 210681, 210688, G03F 700, G03C 172, C08G 804, C02F 142
Patent
active
054767504
ABSTRACT:
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions and a substantially consistent molecular weight. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.
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Bowers Jr. Charles L.
Chu John S.
Hoechst Celanese Corporation
Sayko Jr. Andrew F.
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