Metal ion reduction in photoresist compositions by chelating ion

Details Metal ion reduction in photoresist compositions by chelating ion Metal ion reduction in photoresist compositions by chelating ion

1995-11-27

1999-10-05

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430168, 528482, 210660, 210681, 210682, G03F 7004, C02F 142

Patent

active

059621834

ABSTRACT:
The present invention provides methods for producing a photoresist having a very low level of metal ions, utilizing a treated chelating ion exchange resins to make the neutral ammonium salt or acid form. A method is also provided for producing semiconductor devices using such photoresist compositions.

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